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> Physical vapor deposition
Physical vapor deposition
(PVD) is a technique in
semiconductor device fabrication
used to deposit
thin film
s of various materials onto various surfaces (e.g., of
semiconductor
wafer
s) by physical means, as compared to
chemical vapor deposition
.
Variants of PVD include
Evaporative deposition
Sputtering
Pulsed laser deposition
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